Abstract
A chitosan-based resin possessing the iminodi(methylphosphonic acid) moiety (IDP-type chitosan resin) was synthesized by using cross-linked chitosan as a base material. The adsorption behavior of trace metal ions on the IDP-type chitosan resin was systematically investigated using a mini-column (1 ml of the resin) packed with the resin. The concentrations of metal ions in the effluents were measured by ICP-MS and ICP-AES. The resin could adsorb four metals, such as In(III), Sn(II), Th(IV), and U(VI), by almost 100% over a wide pH range (1-7). Uranium (VI) and thorium could not be eluted with nitric acid and hydrochloric acid (1-6 M); other metal ions were easily and readily eluted with 1 M nitric acid. The IDP-type chitosan resin synthesized in this work can be applied to the separation of U(VI) and Th(IV) from other metal ions.
| Original language | English |
|---|---|
| Pages (from-to) | 1039-1043 |
| Number of pages | 5 |
| Journal | Bunseki Kagaku |
| Volume | 53 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - Sept 2004 |
| Externally published | Yes |
Keywords
- Chitosan resin
- Heavy metals
- Iminodimethylphosphonic acid (IDP)
- Thorium(IV)
- Uranium(VI)
Fingerprint
Dive into the research topics of 'Synthesis of iminodi(methylphosphonic acid)-type chitosan resin and its adsorption behavior for trace metals'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver