Development of RF plasma generator based on Class e Power Amplifier

The plasma produced at 2 MHz radio frequency has substantial energy release stability and can be used to modify a material's surface. The objective of this research is to create a plasma generator operating at a radio frequency of 2 MHz and examine how voltage affects the plasma spectrum that is generated. An AD9833 frequency generator, a class E amplifier, and impedance matching are used in the design of a 2 MHz radio frequency plasma generator as power amplifiers to create plasma. Variations in voltage, gas, and gas flow have been used. The input voltage variations used were 10V and 15V from the power supply. Two different media, free air (atmospheric gas) and argon gas flow, are used for plasma generation. In free air, the plasma formed is Nitrogen plasma with a wavelength of 300 to 380 nm. Argon gas flow is given a variation of Argon gas rate of 2 LPM, and 3 LPM. The plasma formed is Argon plasma with a wavelength of 700 to 850 nm.