A study of non-infrared-active hydrogen bonding in a-Si:H thin film using combined calibrated temperature desorption spectroscopy and FTIR

D. J. Santjojo; J. C.L. Cornish; M. O.G. Talukder

doi:10.1557/proc-609-a26.3

A study of non-infrared-active hydrogen bonding in a-Si:H thin film using combined calibrated temperature desorption spectroscopy and FTIR

D. J. Santjojo
, J. C.L. Cornish
, M. O.G. Talukder

Research output: Contribution to journal › Article › peer-review

Abstract

Non-infrared-active hydrogen bonding species were investigated by analyzing the infrared spectra and the calibrated temperature desorption spectroscopy (CTDS) spectra of hydrogen released during degassing of hydrogenated amorphous silicon thin films. Samples were degassed gradually using a linear temperature ramp (0.5°C/s). Each stage corresponds to a temperature at which the hydrogen effusion peaks can be found (∼340°C, ∼500°C and ∼610°C). Differences in the amounts of hydrogen obtained from the FTIR spectra and the CTDS measurement correspond to the non-infrared-active, occluded hydrogen.

Original language	English
Pages (from-to)	A2631-A2636
Journal	Materials Research Society Symposium-Proceedings
Volume	609
DOIs	https://doi.org/10.1557/proc-609-a26.3
Publication status	Published - 2000
Externally published	Yes

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title = "A study of non-infrared-active hydrogen bonding in a-Si:H thin film using combined calibrated temperature desorption spectroscopy and FTIR",

abstract = "Non-infrared-active hydrogen bonding species were investigated by analyzing the infrared spectra and the calibrated temperature desorption spectroscopy (CTDS) spectra of hydrogen released during degassing of hydrogenated amorphous silicon thin films. Samples were degassed gradually using a linear temperature ramp (0.5°C/s). Each stage corresponds to a temperature at which the hydrogen effusion peaks can be found (∼340°C, ∼500°C and ∼610°C). Differences in the amounts of hydrogen obtained from the FTIR spectra and the CTDS measurement correspond to the non-infrared-active, occluded hydrogen.",

author = "Santjojo, \{D. J.\} and Cornish, \{J. C.L.\} and Talukder, \{M. O.G.\}",

year = "2000",

doi = "10.1557/proc-609-a26.3",

language = "English",

volume = "609",

pages = "A2631--A2636",

journal = "Materials Research Society Symposium-Proceedings",

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publisher = "Materials Research Society",

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T1 - A study of non-infrared-active hydrogen bonding in a-Si:H thin film using combined calibrated temperature desorption spectroscopy and FTIR

AU - Santjojo, D. J.

AU - Cornish, J. C.L.

AU - Talukder, M. O.G.

PY - 2000

Y1 - 2000

N2 - Non-infrared-active hydrogen bonding species were investigated by analyzing the infrared spectra and the calibrated temperature desorption spectroscopy (CTDS) spectra of hydrogen released during degassing of hydrogenated amorphous silicon thin films. Samples were degassed gradually using a linear temperature ramp (0.5°C/s). Each stage corresponds to a temperature at which the hydrogen effusion peaks can be found (∼340°C, ∼500°C and ∼610°C). Differences in the amounts of hydrogen obtained from the FTIR spectra and the CTDS measurement correspond to the non-infrared-active, occluded hydrogen.

AB - Non-infrared-active hydrogen bonding species were investigated by analyzing the infrared spectra and the calibrated temperature desorption spectroscopy (CTDS) spectra of hydrogen released during degassing of hydrogenated amorphous silicon thin films. Samples were degassed gradually using a linear temperature ramp (0.5°C/s). Each stage corresponds to a temperature at which the hydrogen effusion peaks can be found (∼340°C, ∼500°C and ∼610°C). Differences in the amounts of hydrogen obtained from the FTIR spectra and the CTDS measurement correspond to the non-infrared-active, occluded hydrogen.

UR - https://www.scopus.com/pages/publications/0034428412

U2 - 10.1557/proc-609-a26.3

DO - 10.1557/proc-609-a26.3

M3 - Article

AN - SCOPUS:0034428412

SN - 0272-9172

VL - 609

SP - A2631-A2636

JO - Materials Research Society Symposium-Proceedings

JF - Materials Research Society Symposium-Proceedings

ER -

A study of non-infrared-active hydrogen bonding in a-Si:H thin film using combined calibrated temperature desorption spectroscopy and FTIR

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